Emulation of synaptic plasticity in WO3-based ion-gated transistors

dc.creatorKarimi, Ramin
dc.creatorCamargo, Azari Luan Pereira
dc.creatorGarza, José Ramón Herrera
dc.creatorCollins, Liam
dc.creatorTsai, Wan-Yu
dc.creatorNeres, Lariel Chagas da Silva
dc.creatorDang, Patrick
dc.creatorBarbosa, Martin Schwellberger
dc.creatorSantato, Clara
dc.date.accessioned2025-10-01T09:38:29Z
dc.date.available2025-10-01T09:38:29Z
dc.date.issued2025
dc.description.abstractNeuromorphic systems, inspired by the human brain, promise significant advancements in computational efficiency and power consumption by integrating processing and memory functions, thereby addressing the von Neumann bottleneck. This paper explores the synaptic plasticity of a WO3-based ion-gated transistor (IGT) in [EMIM][TFSI] and a 0.1 mol L−1 LiTFSI in [EMIM][TFSI] for neuromorphic computing applications. Cyclic voltammetry (CV), transistor characteristics, and atomic force microscopy (AFM) force–distance (FD) profiling analyses reveal that Li+ brings about ion intercalation, together with higher mobility and conductance, and slower response time (τ). WO3 IGTs exhibit spike amplitude-dependent plasticity (SADP), spike number-dependent plasticity (SNDP), spike duration-dependent plasticity (SDDP), frequency-dependent plasticity (FDP), and paired-pulse facilitation (PPF), which are all crucial for mimicking biological synaptic functions and understanding how to achieve different types of plasticity in the same IGT. The findings underscore the importance of selecting the appropriate ionic medium to optimize the performance of synaptic transistors, enabling the development of neuromorphic systems capable of adaptive learning and real-time processing, which are essential for applications in artificial intelligence (AI).
dc.identifier.citationAZARI, Ramin Karimi et al. Emulation of synaptic plasticity in WO3-based ion-gated transistors. Advanced Electronic Materials, Weinheim, v. 11, n. 8, p. 2400807, 2025. DOI: 10.1002/aelm.202400807. Disponível em: https://advanced.onlinelibrary.wiley.com/doi/10.1002/aelm.202400807. Acesso em: 4 set. 2025.
dc.identifier.doi10.1002/aelm.202400807
dc.identifier.issn2199-160X
dc.identifier.issne- 2199-160X
dc.identifier.urihttps://repositorio.bc.ufg.br//handle/ri/28685
dc.language.isoeng
dc.publisher.countryAlemanha
dc.publisher.departmentInstituto de Química - IQ (RMG)
dc.rightsAcesso Aberto
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/4.0/
dc.subjectIon gated transistors
dc.subjectIon gating media
dc.subjectIon intercalation
dc.subjectNeuromorphic computing
dc.subjectSynaptic plasticity
dc.subjectSynaptic transistors
dc.titleEmulation of synaptic plasticity in WO3-based ion-gated transistors
dc.typeArtigo

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